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AH series thermal cracking source

The AH series thermal cracking source is a cost-effective atomic hydrogen source that can crack high-purity hydrogen gas into highly active hydrogen atoms at high temperatures. It is commonly used for substrate cleaning, removal of oxides, promotion of atomic migration, and adjustment of gallium nitride growth rate. The heating wire in the gas transmission conduit is made of high-temperature resistant tungsten wire material, which can be heated to 1800-2200 ℃. The AH series thermal cracking source is additionally equipped with water-cooled flanges, which can significantly reduce thermal radiation and minimize material high-temperature gas release. The specially designed diffusion plate structure can control the distribution of atomic hydrogen and improve beam uniformity. In addition, the atomic hydrogen thermal cracking source can only produce hydrogen atoms and hydrogen molecules, which can effectively avoid substrate damage.

Product Features
Low cost, high performance; Low temperature in-situ substrate cleaning●  Improve the two-dimensional growth of materials; Provide atomic level flat surface


Technical Parameter

Thermal cracking source modelAll R&D and production MBE systems
Applicable gas sourceH2
Minimum installation flange sizeCF35
Total length (mm)494
Length inside vacuum (mm)343
Vacuum inner and outer diameters (mm)151
Heating methodRadiation heating, self-supporting tungsten wire
Air intake1/4 VCR
Common working temperature1800-2200℃
Maximum degassing temperature2500℃
CoolingStandard water-cooled flange

Baking temperature

250℃
Order code3100160001


Test data

资源 18@4x.png

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