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RFPS Radio Frequency Plasma Source

RFPS radio frequency plasma source is specially designed for high-flux active neutral products. Through the coil structure, it can stimulate and generate plasma in the vacuum chamber. The types of exciting gases include but are not limited to H2, N2, O2, rare gases, etc., with better stability and more precise controllability. It can provide high-flux atomic hydrogen, atomic oxygen, and atomic nitrogen for MBE and passivation treatment systems. The special nozzle plate structure design can effectively suppress the damage of high-energy particles to the substrate surface and optimize the beam distribution.

RFPS is equipped with a fully automatic radio frequency power supply matcher, which can be matched quickly.


Features
Efficient and stable growth of nitrides, oxides, and hydrides●  Precise control performance, easy to useThere are atomic screening holes inside to minimize the number of ions reaching the substrate. The output port can be changed according to the needs


Technical Parameters

Evaporation source model
RFPS200-ARFPS200-BRFPS200-CRFPS200-D
gas loadN2, H2O2, H2N2, H2 O2, H2
Ion generation zone materialsPBNQuartzPBNQuartz
Mounting flange sizeCF63CF100
Total length (mm)824±2824±2
Length in vacuum (mm)400±2400±2

Vacuum inner and outer diameter (mm)
5471
Cooling mode port≥0.5; recommended to be greater than 2
Air intake interface1/4VCR
RF matcher13.56MHz / 500W; 1000W optional
Plasma SpectroscopyOptional

For information on RFPS plasma source compatibility with Riber or Veeco MBE systems, please contact Fee-Mian Instruments


Test Data

资源 13@4x.png

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