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MBE 300 mainly uses a cylindrical 316 stainless steel cavity processed by argon arc welding. The flange size at the top of the cavity is CF250, and up to 9 beam source furnaces can be installed. Multiple crucible magnetic deflection electron beams can be installed according to user needs, suitable for small-sized (matched with flag shaped sample holders) sample growth.
| ● A mature, stable, and cost-effective system | ● Modular design, flexible matching of furnace sources, pump sets, and other components to meet different needs | ● It can be used as an independent system or interconnected with other ultra-high vacuum systems |
| MBE 300 | Module Description | Configuration parameter | |
| Growth chamber | Cavity | Material of the cavity | SS316 |
| Cavity Size | 200mm I.D | ||
| Baking temperature | Max.200℃ | ||
| Background vacuum | < 5×10-10 mbar | ||
| Pumping system | 450L/s molecular pump +10m3/h mechanical pump | ||
| Vacuum measurement system | Ionic gauge+Pirani gauge | ||
| Liquid nitrogen cold screen | Optional | ||
| Ion pump | Optional | ||
| Sample Holder | Sample size | Flag type sample holder | |
| Substrate heating method | Radiant heating | ||
| Substrate heater temperature | Room temperature-1200K | ||
| Electron beam heating | Optional | ||
| Dc heating | Optional | ||
| Liquid nitrogen refrigeration module | Optional | ||
| Component | Steam source configuration | 4xDN40CF, 4xDN63CF, 1xDN100CF | |
| Independent evaporation source baffle | Pneumatic drive | ||
| QCM | Standard configuration | ||
| RHEED | 15KeV-30KeV | ||
| Ion Source | Optional | ||
| RGA | Optional | ||
| Rapid injection room | Cavity | Material of the cavity | SS316 |
| Baking temperature | Max.200℃ | ||
| Background vacuum | <5×10-8 mbar | ||
| Pumping system | 80L/s molecular pump +10m3/h mechanical pump | ||
| Vacuum measurement system | Full range gauge | ||
| Component | Sample Parking Platform | 6 or 12 workstations | |
| System integration and control | GUIDE software | Standard configuration | |
| Baking system | Standard configuration | ||
| System bracket | Standard configuration | ||
| Vacuum lighting system | Optional | ||
| Plasma cleaning | Optional | ||
| CCD camera | Optional | ||
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