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● The growth chamber is a spherical structure made of SS316 stainless steel
● Modular design not only meets the needs of existing material preparation, but also provides the possibility of future expansion
● Compact structure and small footprint
● Configuration and performance indicators meet the needs of high-precision thin film material preparation
● Wide range of applications, such as: superconducting films, topological insulators, transition metal chalcogenides (TMDCs), heterostructures, organic matter, etc.
| Growth chamber | Growth chamber vacuum limit: <5×10-10 mbar |
| Ultra-high vacuum pumping system: 300L/s molecular pump (Edwards or Pfeiffer brand), including front-stage mechanical pump and supporting vacuum pipelines, safety valves, etc. | |
| Vacuum measurement: ion gauge and Pirani vacuum gauge, covering the measurement range of 2×10-11 mbar to atmospheric pressure, and integrated with the vacuum control system to achieve system safety protection | |
| 4-axis sample holder (horizontally installed): matches the standard flag-type sample holder, working temperature: room temperature-1200K; optional low temperature module (liquid nitrogen cooling), electron beam heating module, or Direct Heating module | |
| Includes film thickness meter (QCM) and matching linear drive to realize the mobile operation of the crystal oscillator probe | |
| Evaporation source installation port: 4; low, medium, high, and electron beam evaporation sources can be configured according to actual user needs | |
| Optional ion source (Ion Source) | |
| Optional high energy electron diffractometer (RHEED) | |
| Fast sample chamber | Background vacuum: <5×10-8 mbar |
| Ultra-high vacuum pumping system: 80L/s molecular pump (Edwards or Pfeiffer brand), including front-stage mechanical pump and supporting vacuum pipeline, safety valve, vent valve, etc. | |
| Vacuum measurement: full-range vacuum gauge, covering the measurement range of 5×10-9 mbar to atmospheric pressure, and integrated with the vacuum control system to achieve system safety protection | |
| Sample parking station: 6 parking positions (upgradeable to 12 parking positions) | |
| Sample transfer device: 600mm stroke sample transfer rod, including sample holder gripper and flange adjuster | |
| VAT CF63 gate valve, used to separate the growth chamber and the fast sample chamber | |
| System integration and control | Vacuum control and protection system, integrating vacuum gauge signal, molecular pump control, evaporation source protection, baking protection and other functions |
| Contains temperature control software for evaporation source and sample rack | |
| Hot air baking module, uniform baking temperature, easy to disassemble |
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