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HMF-MBE-200 High Magnetic Field MBE System

HMF-MBE 200 is equipped with different types of evaporation sources, suitable for studying various material systems under strong magnetic fields. It can grow metal, magnetic thin films, and semiconductor heterojunctions, and is suitable for interconnecting multiple in-situ measurement systems. At the same time, the system is easy to operate, with a modular chamber configuration that facilitates daily maintenance and upkeep.

Product Features
Integrated helium free strong magnetic field superconducting magnetMolecular beam epitaxy growth can be achieved under strong magnetic field conditions at room temperature
● Growth source components:3xDN40CF (growth of ferromagnetic materials under strong magnetic field), 2xDN40CF (growth of conventional metals), 1xDN40CF (RF plasma source)

Technical Parameter
HMF-MBE-200
Module DescriptionConfiguration parameter
Growth chamber

CavityMaterial of the cavitySS316
Cavity Size200mm I.D
Baking temperatureMax.200℃
Background vacuum< 5×10-10 mbar
Pumping system300L/s molecular pump +10m3/h mechanical pump
Vacuum measurement systemIonic gauge+Pirani gauge
Ion pumpOptional
Sample HolderSample sizeFlag-type Sample holder
Substrate heating methodRadiant heating
Substrate heater temperature1200K
ComponentSteam source configuration6xDN40CF
Independent evaporation source bafflePneumatic drive
QCMOptional
Ion SourceOptional
RGAOptional
Superconducting magnetMagnet typeDry/GM refrigeration
Magnetic environmentRoom temperature chamber
Inner diameter of cavity105mm
Magnetic field intensity±9T
Magnetic field uniformity<0.1%
Rapid injection room
CavityMaterial of the cavitySS316
Baking temperatureMax.200℃
Background vacuum<5×10-8 mbar
Pumping system80L/s molecular pump +10m3/h mechanical pump
Vacuum measurement systemFull range gauge
ComponentSample Parking Platform6 or 12 workstations
Sample transfer rodCF35/600mm
ManipulatorCF35/150mm
System integration and controlGUIDE softwareStandard configuration
Baking systemStandard configuration
System bracketStandard configuration
Vacuum lighting systemOptional
Plasma cleaningOptional
CCD cameraOptional


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