Your current location: Home > Products > R&D Instruments > Thin film preparation > MBE System > Sphere-300 mole... Sphere 300 mainly uses a spherical 316 stainless steel cavity processed by argon arc welding, with a diameter of 300mm, and can accommodate up to 5 evaporation sources. The Sphere 300 growth chamber is reserved with multiple flange ports, which have complete functions and can achieve RHEED in-situ characterization. The system is suitable for the growth of small-sized (matching flag shaped sample holders) samples and is very suitable for scientific research users to prepare high-quality thin films.
| ● A small and economical molecular beam epitaxy system | ● A fully functional molecular beam epitaxy system that can be combined with RHEED in-situ measurement | ● Can be used as a preprocessing system for sample processing before or after growth |
| Sphere-300 | Module Description | Configuration parameter | |
| Growth chamber | Cavity | Material of the cavity | SS316 |
| Cavity Size | 300mm I.D | ||
| Baking temperature | Max.200℃ | ||
| Background vacuum | < 5×10-10 mbar | ||
| Pumping system | 300L/s molecular pump +10m3/h mechanical pump | ||
| Vacuum measurement system | Ionic gauge+Pirani gauge | ||
| Ion pump | Optional | ||
| Sample Holder | Sample size | Flag-type Sample holder | |
| Substrate heating method | Radiant heating | ||
| Substrate heater temperature | Room temperature-1200K | ||
| Electron beam heating | Optional | ||
| Dc heating | Optional | ||
| Liquid nitrogen refrigeration module | Optional | ||
| Component | Steam source configuration | 3xDN40CF, 1xDN100CF | |
| Independent evaporation source baffle | Pneumatic drive | ||
| QCM | Standard configuration | ||
| RHEED | 15KeV-30KeV | ||
| Ion Source | Optional | ||
| RGA | Optional | ||
| Superconducting magnet | Magnet type | Dry/GM refrigeration | |
| Magnetic environment | Room temperature chamber | ||
| Inner diameter of cavity | 105mm | ||
| Magnetic field intensity | ±9T | ||
| Magnetic field uniformity | <0.1% | ||
| Rapid injection room | Cavity | Material of the cavity | SS316 |
| Baking temperature | Max.200℃ | ||
| Background vacuum | <5×10-8 mbar | ||
| Pumping system | 80L/s molecular pump +10m3/h mechanical pump | ||
| Vacuum measurement system | Full range gauge | ||
| Component | Sample Parking Platform | 6 or 12 workstations | |
| Sample transfer rod | CF35/600mm | ||
| Manipulator | CF35/150mm | ||
| System integration and control | GUIDE software | Standard configuration | |
| Baking system | Standard configuration | ||
| System bracket | Standard configuration | ||
| Vacuum lighting system | Optional | ||
| Plasma cleaning | Optional | ||
| CCD camera | Optional | ||

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