Your current location: Home > Products > Plasma > High efficiency RF plasma source > High beam curre... 
FERMI-RFPS-200 is a new high-efficiency RF plasma source produced by Fermi Instruments. It can generate plasma in a vacuum chamber through a coil structure. The types of exciting gases include but are not limited to H2, N2, O2, rare gases, etc. It has better stability and more precise controllability. It is widely used in molecular beam epitaxy (MBE) systems for nitride growth, nitrogen atom implantation and doping, oxide growth, oxygen atom implantation and doping, hydride growth, and hydrogen atom surface cleaning.
| ● Efficient and stable growth of nitrides, oxides, and hydrides | ● Precise control performance, simple and easy to use | ● The lead-out port can be replaced according to needs |
| ● There are atomic screening holes inside to minimize the number of ions reaching the substrate | ● Suitable for MBE, vacuum cleavage coating, hydrogen atom substrate cleaning and other systems |
| Type | FERMI-RFPS-200 | |
| Vacuum compatibility | CF100 standard flange | |
| Gas load | N2, H2 | O2,H2 |
| Ion generation zone materials | PBN | Quartz |
| Cooling method | Water cooling | |
| Air inlet | VCR1/4 connector | |
| Vacuum working distance | 100-200mm | |
| RF matching device | 13.56MHz/500W | |
| Water cooling flow rate | >1 L/min | |
| Manual, automatic RF matching device | Optional | |
| Plasma spectrum detection | Optional | |
Atomic hydrogen substrate deoxidation treatment and epitaxial test:
Actual case of RF ion source for MBE growth: vacuum cleavage coating system
 |  |
After receiving the information, our sales personnel/product engineers will contact you
Some products can be customized according to your needs
Your information will be kept confidential throughout the entire process
中文
021-6525 3206
National Service Hotline
Detailed Inquiry
