Your current location: Home > Products > R&D Instruments > Sample processing > Ion/Atom Processing > Remote plasma s... This product adopts a new remote low-temperature plasma excitation technology, which separates the plasma generation chamber and processing chamber, and has the characteristics of high excitation efficiency and low overall temperature.
| ● Compatible with gases: Air and oxygen | ● Working pressure:5Pa-20Pa(recommend) | ● Install flange:DN40CF |
| ● Heat dissipation method:Water-cooling | ● Usage frequency:40kHz |


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