中文 021-6525 3206

Your current location: Home > Products > Industrial MBE > System equipment > MBE800 Molecular Beam Epitaxy System > MBE-800 molecul...

MBE-800 molecular beam epitaxy system

In order to achieve epitaxial growth of materials on 4-inch wafers, Fermion Instrument has launched the MBE-800 molecular beam epitaxy system. The standard version system adopts a dual temperature zone substrate heater and includes 12 evaporation source ports, which can achieve precise layer by layer growth of complex structured thin films. The customized version of MBE-800 also covers specific production needs, such as ultra-high vacuum ion assisted coating systems.

The MBE-800 system has high reliability, versatility, and compactness, and is compatible with epitaxial growth on substrates under 4 inches. This system can not only serve as an application development device, but also be suitable for quasi batch production applications.

Description
MBE-800 Manual sample transfer system
319e2d10-fc84-43e2-8c68-a8a99a25a252.png


MBE-800 Manual sample transfer systemBy using a magnetic coupling transfer rod, 4-inch samples can be transferred. The robotic arm can travel up to 1200mm, meeting the requirements for substrate transfer between the growth chamber and the pre-processing chamber. At the same time, the robotic arm can provide a movement space of 25mm in the vertical direction, meeting the requirements for substrate retrieval and placement operations. This sample transfer system does not require the use of secondary motion tools, greatly simplifying the substrate transfer steps while reducing costs.
The MBE-800 manual sample transfer system can also connect the rapid injection chamber and the heat treatment chamber through a straight line segment. The vacuum sample transfer car developed by Fermion Instrument can not only achieve free transfer of substrates between the rapid injection chamber and the pretreatment chamber, but also greatly increase the number of samples parked, making the system more suitable for quasi batch production applications. 

MBE-800 Fully automatic sample transfer system
080d58fd-5d79-4f27-862d-a3ac7cdb3601.png


MBE-800 Cluster Fully automatic sample transfer systemIntegrating different chambers on a circular sample transfer chamber, coupled with a 360 ° continuously rotating robotic arm component, with a maximum stroke of 1350mm, can achieve vacuum transfer of substrates between different chambers. The robotic arm is driven to rotate by a high torque magnetic coupling driver, and precise positioning is achieved by a positioning substrate installed at the front end of the robotic arm. The robotic arm can provide 0-25mm free movement in the vertical direction through linear drive, achieving substrate picking and placing operations.


According to customer requirements, Fermion Instrument provides different models of thermal evaporation sources, cracking sources, electron beam evaporation sources, and gas sources. The system can install RHEED, QCM, BFM, RGA, OFM, etc. to achieve in-situ monitoring of thin film growth. Fermion Instrument provides MBE operation software, including three major functions: growth process program writing, automatic growth control, and uninterrupted data recording. It can execute growth process program to control baffle movement, source furnace temperature, substrate temperature, substrate rotation speed and direction. The control software includes process requirements such as temperature curve, vacuum pressure curve, power output curve, and sample transfer between various systems to ensure the repeatability and safety of the growth process.


ConfigurationMBE-800
Growth chamber
Cavity Size650mm I.D.
Vacuum<2×10-10mbar
Liquid nitrogen cold screenStandard configuration
Extreme vacuum after passing liquid nitrogen through the cold screen
<5×10-11mbar
Maximum temperature of substrate heater
1000℃
Temperature stability of substrate heater
PID control,±0.5℃
Maximum size of substrate
4inch
Substrate rotation
60RPM
Steam source configuration
CF63×2/CF100×7 / CF125×3
Independent evaporation source shuttermotor drive
Ionic gauge
1×10-3~2×10-11mbar
Baking temperature
200℃
Prepare ChamberVacuum<2×10-10mbar
Water-cooled interlayer of the cavityOptional
Maximum temperature of pre-treatment heater
450℃
Ionic gauge1×10-3~2×10-11mbar
Load lockVacuum<1×10-8mbar
Water-cooled interlayer of the cavityOptional
Sample Parking Platform4-10 pieces
Infrared baking lampOptional
Full range gauge
1×103~5×10-9mbar
Cluster ChamberVacuum<5×10-10mbar
Pressure during sample transmission<1×10-9mbar
Maximum manual sample transfer travel1200mm
Automatic sample transfer maximum travel1350mm
Ionic gauge1×10-3~2×10-11mbar
Storage ChamberSample Parking Platform10 (optional)
System controlTouch screen operation panel
Standard configuration
Programming of growth process
Standard configuration
Automatic growth control
Standard configuration
Continuous data recordingStandard configuration
Alarm protection functionStandard configuration
Interlocking functionStandard configuration
OptionalCCDOptional
Glove boxOptional
Phosphorus recovery system
Optional
Substrate infrared temperature measurement system
Optional
Vacuum lighting system
Optional
SMSOptional


Contact Us

After receiving the information, our sales personnel/product engineers will contact you

Some products can be customized according to your needs

Your information will be kept confidential throughout the entire process

Related Products
    No Data
TOP