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MBE-600 molecular beam epitaxy system

The MBE-600 system is highly suitable for III-V, II-VI material applications, as it can epitaxy on 1, 2, and 3-inch substrates. Its vertical chamber design and various advanced components enable precise layer by layer epitaxy.

The outstanding features of the MBE-600 system are its high reliability, versatility, and compactness, which make it particularly suitable for research and development applications as well as quasi mass production. The standard version of MBE-600 includes 10 source ports, with 7 flange sizes of 4.5 inches (DN63CF) and 3 flange sizes of 2.75 inches (DN35CF). The customized version of MBE-600 also covers specific production needs, such as ultra-high vacuum cleavage coating systems.

Description

According to the requirements of all our customers, we provide different types of ordinary evaporation sources, cracked sources with valves, gas sources, and electron beam evaporation sources. By using BFM, QCM, RHEED, RGA, etc., in-situ characterization of the system can be obtained. Fermion's MBE software includes three major functions: programming for growth processes, automatic growth control, and uninterrupted data recording. The growth process program can be executed to control the movement of the baffle, source furnace temperature, substrate temperature, substrate rotation speed and direction. Ensure maximum operational repeatability and safety. The control software includes process requirements such as temperature curve, vacuum pressure curve, power output curve, and sample transfer between various systems.


MBE-600 Manual sample transfer system


Can perform 3-inch substrate transfer. Fermion Instrument transforms traditional substrate transfer methods into a fully functional device. This system not only provides horizontal linear motion for substrate transfer, but also offers up to 25 mm of vertical movement space for up and down movement to remove or place substrates. This system does not require the use of secondary motion tools, reducing costs and greatly simplifying substrate transfer technology.

MBE-600 Cluster Fully automatic sample transfer system


The substrate can be easily transferred to various chambers without compromising the vacuum level of the MBE chamber. Cluster Tool is a mechanical arm component installed on the top or bottom of a UFO, which can rotate continuously 360 °, with the purpose of transferring substrates throughout the MBE system; Paired with a linear drive device, it achieves free movement in the vertical direction of 0-50mm, with the aim of placing and grasping substrates. The end of the robotic arm can be paired with a 3-inch substrate gripping head, with a maximum load capacity of 1kg. The robotic arm is driven by a high torque magnetic coupling driver to rotate to the desired vacuum chamber port, and the positioning substrate is installed on the front end of the robotic arm to detect the process of the robotic arm moving the substrate within the system module.




ConfigurationMBE-600
Growth chamber
Cavity Size450mm I.D.
Vacuum<2×10-10mbar
Liquid nitrogen cold screenStandard configuration
Extreme vacuum after passing liquid nitrogen through the cold screen
<5×10-11mbar
Maximum temperature of substrate heater
1000℃
Temperature stability of substrate heater
±0.5℃
Maximum size of substrate
3inch
Substrate rotation
60RPM
Steam source configuration
CF35×3/CF63×7
Independent evaporation source shutter
Motor drive
Ionic gauge
1×10-3~2×10-11mbar
Baking temperature
200℃
Prepare ChamberVacuum<2×10-10mbar
Maximum temperature of pre-treatment heater
450℃
Ionic gauge1×10-3~2×10-11mbar
Load lockVacuum<1×10-8mbar
Sample Parking PlatformAt least 4+2
Infrared baking lampOptional
Full range gauge
1×103~5×10-9mbar
Sample ChamberVacuum<5×10-10mbar
Pressure during sample transmission<1×10-9mbar
Manual/Fully AutomaticOptional
Ionic gauge1×10-3~2×10-11mbar
Sample Parking PlatformAt least 4+2
System controlTouch screen operation panel
Standard configuration
Programming of growth process
Standard configuration
Automatic growth control
Standard configuration
Continuous data recordingStandard configuration
Alarm protection functionStandard configuration
Interlocking functionStandard configuration
OptionalCCDOptional
Glove boxOptional
Phosphorus recovery system
Optional
Substrate infrared temperature measurement system
Optional
Vacuum lighting system
Optional
SMSOptional
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