MBE-2000 molecular beam epitaxy system

Batch production MBE system, economical, efficient, and high output

Maximum epitaxial substrates of 9 × 4 inches, 4 × 6 inches, 15 × 3 inches, and 32 × 2 inches; MBE daily work is fully automated: sample transfer, beam calibration, epitaxial growth, etc; Can achieve 24/7 batch production mode.

Equipped with an in-situ monitoring system to monitor growth status in real-time

Reflective High Energy Electron Diffraction (RHEED), Beam Gauge (BFM), Residual Gas Analysis (RGA), with more reserved installation ports for in-situ monitoring equipment and the ability to upgrade and expand.

The system occupies a small space and allows for twin long cavity modules

The modular chamber structure system occupies less space than the same type of MBE system and can support two growth chamber modules, greatly increasing production and allowing incompatible material systems to grow.

The system operation is simple and the average running cycle is long

The system is easy to operate, with a simple and friendly interface, and comes with safety interlock alarm and anti misoperation functions. The modular multi chamber configuration is equipped with independent pump sets and gate valves for each chamber, making maintenance easy and convenient, and maximizing the normal operation time of the system.

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