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Sputtering 100 is a magnetron thin film deposition equipment developed by Fermian Instruments for universities and research institutes. It is used to grow superconducting films, magnetic films, optical and decorative coatings, solid-state thin film lithium batteries, organic electronics (OLED and OPV), perovskite films for photovoltaic and electronic products, and films for stripping processes. The Sputtering 100 magnetron sputtering system uses a fully modular magnetron sputtering source that is easy to disassemble, replace or repair. The Sputtering 100 magnetron sputtering system is equipped with a complete pump station, vacuum instrumentation, distribution box, electronic rack, and safety interlocks, and can be operated manually or by computer control. The system reserves various model interfaces and provides a variety of expansions to meet customers' thin film deposition requirements.
| ● Suitable for the growth of single-layer and multi-layer films at the nanoscale | ● High film formation rate, low substrate temperature, good film adhesion, and large-area coating can be achieved | ● Can be connected to ultra-high vacuum interconnection system |
Sputtering 100 | Module Description | Configuration parameters | |
Growth Room | Cavity | Cavity material | SS316 |
Chamber size | 400mm I.D. | ||
Baking temperature | Max.200℃ | ||
Background vacuum | < 8×10-9mbar | ||
Pumping system | 700L/s molecular pump + 10L/s mechanical pump | ||
Vacuum measurement system | Full range gauge + thin film gauge + Pirana gauge | ||
Ion pump/TSP/NEG | Optional | ||
Sample holder | Maximum sample size | 6 inches | |
Substrate heating method | SiC heating | ||
Substrate heater temperature | 1000℃ | ||
Maximum substrate rotation speed | 30RPM | ||
Sputtering target group | Number of target guns | 6 | |
Target gun size | 2 inches | ||
Power supply configuration | DC (500W) / RF (1000W) | ||
Target head | Angle and position adjustable | ||
Air intake | |||
Air intake on target surface | |||
Independent magnetic control baffle | Pneumatic drive | ||
Mass flow meter | Four way/50sccm | ||
Parts | QCM | Standard configuration | |
Ion Source | Optional | ||
RGA | Optional | ||
Quick Sample Injection Chamber | Cavity | Chamber material | SS316 |
Baking temperature | Max.200℃ | ||
Background vacuum | < 5×10-8mbar | ||
Pumping system | 80L/s molecular pump + 10L/s mechanical pump | ||
Vacuum measurement system | Full range gauge | ||
Components | Sample parking table | 3 stations | |
Sample transfer rod | CF35/600mm | ||
Software and hardware integration | Control software | Standard configuration | |
Infrared thermometer | Standard configuration | ||
Baking system | Standard configuration | ||
System bracket | Standard configuration | ||
Vacuum lighting system | Standard configuration | ||
Pump truck | Optional | ||
Plasma cleaning | Optional | ||
CCD camera | Optional | ||
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