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RF plasma source, which generates plasma through coil-type structure excitation, is suitable for H2, N2, O2, rare gases, etc. It has better stability and more precise controllability, and is widely used in nitride growth, nitrogen atom injection and doping, oxide growth, oxygen atom injection and doping, hydride growth and hydrogen atom surface cleaning, etc.
| ● Efficient and stable growth of nitrides, oxides, and hydrides | ● Precise control performance, simple and easy to use | ● The lead-out port can be replaced according to needs |
| ● There are atomic screening holes inside to minimize the number of ions reaching the substrate | ● Suitable for MBE, vacuum cleavage coating, hydrogen atom substrate cleaning and other systems |
| Type | FERMI-RFPS-200 | |
| Vacuum compatibility | CF100 standard flange | |
| Gas load | N2, H2 | O2,H2 |
| Ion generation zone materials | PBN | Quartz |
| Cooling method | Water cooling | |
| Air inlet | VCR1/4 connector | |
| Vacuum working distance | 100-200mm | |
| RF matching device | 13.56MHz/500W | |
| Water cooling flow rate | >1 L/min | |
| Manual, automatic RF matching device | Optional | |
| Plasma spectrum detection | Optional | |
Atomic hydrogen substrate deoxidation treatment and epitaxial testing:
Practical example of RF ion source for MBE growth: vacuum cleavage coating system
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