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Fermion Instrument can provide traditional tube furnace CVD equipment and plasma enhanced chemical vapor deposition (PECVD) equipment. Due to the presence of plasma, the temperature at which thin film deposition occurs in PECVD is much lower than that in traditional CVD.
| ● Furnace size:60/80/100/120×400mm (Diameter x Heating Zone) | ● Operating temperature:The maximum temperature is 1200 ℃, and the continuous working temperature is ≤ 1100 ℃ | ● Vacuum degree:<1E-3mbar(Mechanical pump) |
| ● Temperature control system:Has PID regulation and self-tuning function | ● Temperature control accuracy:±1℃ | ● Heating rate:Recommended ≤ 10 ℃/min, with a maximum heating rate of 15 ℃/min |
| ● Temperature control mode:Power 5-500W, frequency 13.56MHz, automatic matching | ● Interconnection situation:Can be interconnected with various thin film preparation, characterization and measurement devices |
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