Your current location: Home > Products > R&D Instruments > Thin film preparation > ALD System > Customized ALD ... 
The ICP remote plasma assisted ALD equipment provided by Fermion Instrument mainly consists of plasma modules, gas path modules, and reaction chambers. It can provide customized ALD system solutions to meet the needs of customers with different sample sizes and reaction conditions.
| ● Usage mode:Compatible with continuous sedimentation and resident sedimentation modes | ● Precursor gas path:Multi input structure, customizable to customers | ● Temperature accuracy:±1℃ |
| ● Applicable gases:O2，H2，N2，NH3Can be used to generate plasma | ● Uniformity of reaction chamber temperature:≥99% | ● Plasma power supply:300W RF power supply (including automatic matching device) |
After receiving the information, our sales personnel/product engineers will contact you
Some products can be customized according to your needs
Your information will be kept confidential throughout the entire process
中文
021-6525 3206
National Service Hotline
Detailed Inquiry