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This research application device is equipped with 12 evaporation source installation ports, which are flexible and suitable for various material system research. It can epitaxy 3 pieces of 3-inch or 6-inch substrates at a time, with a simple and friendly operating interface and modular maintenance design. The structure is compact and energy-saving, especially using liquid nitrogen cold screen and low-power pump group, achieving high performance and cost savings.
| Configuration | MBE-800P MBE system | |
| Growth chamber | Cavity Size | 650mm I.D. |
| Liquid nitrogen cold screen | Standard configuration | |
| Maximum temperature of substrate heater | 1000℃ | |
| Temperature stability of substrate heater | ±0.2℃ | |
| Maximum size of substrate | 6inch | |
| Maximum rotation speed of substrate | 60RPM | |
| Steam source configuration | 12×CF100 | |
| Independent evaporation source baffle | Motor drive | |
| Baking temperature | 200℃ | |
| RHEED | 15~30keV | |
| RGA | 0-200amu | |
| Pretreatment | Maximum temperature of pre-treatment heater | 600℃ |
| Sample injection room | Sample Parking Platform | 6 of them |
| Infrared baking lamp | Optional | |
| MBE software | GUIDE software | Add configuration |
| Optional | CCD camera | Optional |
| Glove box | Optional | |
| Pollutant recovery system | Optional | |
| Vacuum lighting system | Optional | |
| Pump truck | Optional | |
| Vacuum lighting system | Optional | |
| Atomic Absorption Spectroscopy Beam Monitoring System AAFM-3 | Optional | |
| Substrate Real Temperature Monitoring System BTM-100 | Optional | |
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