Growth chamber base vacuum: <5×10^-10 mbar

   Ultra-high vacuum pumping system: turbomolecular pump (Edwards or Pfeiffer) with a pumping speed of more than 600L/s, including a front-end mechanical pump and supporting vacuum pipelines, safety valves, etc.; optional ion pumps, TSP, etc. to achieve better background vacuum

   Vacuum measurement: ion gauge and Pirani gauge, covering the measurement range from 2×10-11 mbar to atmospheric pressure, and are integrated with the vacuum control system to achieve system safety protection

   4-axis sample holder (installed in vertical direction): compatible with ozone, standard flag-type sample holder (substrate size up to 2-inch), working temperature: room temperature -1200K; optional low-temperature module (liquid nitrogen refrigeration), Electron beam heating module, or Direct Heating module

   Contains a Quartz Crystal Microbalance (QCM) and supporting linear drive to realize the mobile operation of the crystal oscillator probe

   Evaporation source installation ports: 8; low, medium, high, and electron beam evaporation sources can be configured according to the actual needs of the user; including a specially designed differential extraction module, which enables filling and replacement of evaporation sources without destroying the main cavity vacuum. And ozone differential extraction during film growth to improve the antioxidant capacity of the evaporation source

   Contains an evaporation source baffle (integrated water cooling module) to enable automatic growth of thin film samples

   Contains high-purity ozone purification and injection system (Ozone)

   Optional high-precision mask (Mask)

   Optional ion source (Ion Source)

   Optional plasma source (Plasma Source)

   Optional reflection high-energy electron diffraction (RHEED)

   Optional liquid nitrogen cold well